Low residue antiperspirant creams

A - Human Necessities – 61 – K

Patent

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167/311

A61K 7/32 (1990.01)

Patent

CA 2011565

LOW RESIDUE ANTIPERSPIRANT CREAMS Abstract of the Disclosure Antiperspirant cream compositions, which exhibit reduced residue on the skin and excellent cosmetics and aesthetics, as well as good composition stability over time, are claimed. These compositions, which may be formulated to have relatively high viscosities, include a volatile silicone material, a particulate antiperspirant active, a clay thickening agent, an activator for the clay thickening agent, and a non-volatile paraffinic hydro- carbon fluid, such as mineral oil or branched chain C16-C68 hydrocarbons. A method of treating or preventing perspiration in humans using these compositions is also claimed.

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