Low residue cleaning solution

Details Low residue cleaning solution Low residue cleaning solution

C - Chemistry, Metallurgy

11

D

C11D 3/48 (2006.01) C11D 1/66 (2006.01) C11D 17/04 (2006.01)

Patent

CA 2672748

Cleaning compositions containing C8-C10 alkylpolyglucosides, have low filming and streaking when combined with C2-C4 alcohols and propylene glycol ethers. The low filming and streaking occurs even in the presence of quaternary ammonium biocides.

L'invention concerne des compositions de nettoyage contenant des alkylpolyglucosides en C8 à C10 présentant de faibles propriétés de dépôt de films et de stries en combinaison avec des alcools en C2 à C4 et des éthers de propylène glycol. Les faibles propriétés de dépôt de film et de strie se manifestent même en présence de biocides d'ammonium quaternaire.

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