C - Chemistry – Metallurgy – 09 – K
Patent
C - Chemistry, Metallurgy
09
K
C09K 8/68 (2006.01) C09K 8/524 (2006.01) C09K 8/80 (2006.01) E21B 43/27 (2006.01)
Patent
CA 2423096
A low residue well treatment fluid comprises: an aqueous solvent; a gelling agent comprising one or more modified polysaccharides, the modified polysaccharides having hydrophilic groups; and a crosslinking composition. The fluid may optionally further comprise a gel breaker, a buffer and/or a proppant. The fluids generate no or minimal residue upon being broken, and are particularly useful in well fracturing operations.
Qu Qi
Wang Xiaolan
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Bj Services Company
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