Low striation positive resist composition

Details Low striation positive resist composition Low striation positive resist composition

G - Physics

03

C

96/162

G03C 1/54 (2006.01) G03F 7/004 (2006.01) G03F 7/022 (2006.01)

Patent

CA 1213769

ABSTRACT LOW STRIATION POSITIVE RESIST COMPOSITION A novel photoresist formulation is provided which provides low striations and excellent wetting prop- erties. The photoresist composition may be applied by spin casting on various substrates used in integrated circuit manufacture. The essential component in this invention is the solvent composition which consists of cyclopentanone (or cyclopentanone-cyclohexanone blend) in combination with an aliphatic alcohol of 5-12 carbon atoms. These solvent components when used in certain specific ratios provide unexpectedly good wetting of various substrates and low striation films.

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