Low vacuum pumping system

F - Mech Eng,Light,Heat,Weapons – 04 – D

Patent

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230/137, 230/28

F04D 25/04 (2006.01) F04C 19/00 (2006.01)

Patent

CA 1038835

Abstract of the Disclosure A pumping system for evacuating a chamber includes a liquid ring pump and a gas-liquid separator. The separator has a lower portion containing a pool of liquid and an upper portion containing a gas. The liquid ring pump has a pump gas inlet port, a pump liquid inlet port, and a pump exhaust port. An inlet pipe delivers fluid flow between the pump exhaust port and the separator. An outlet pipe, between the lower portion and the pump liquid inlet port, recirculates the liquid to the pump. The improvement comprises an auxiliary vacuum apparatus which is connected to the upper portion for degassing the liquid in the separator whereby the low pressure limit of the liquid ring pump is substantially reduced.

240104

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