C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
167/208, 167/262
C07C 65/38 (2006.01) A61K 31/19 (2006.01) A61K 31/33 (2006.01) C07C 59/70 (2006.01) C07C 59/74 (2006.01) C07C 65/19 (2006.01) C07C 65/30 (2006.01) C07C 311/51 (2006.01) C07D 213/79 (2006.01) C07D 257/04 (2006.01) C07D 307/68 (2006.01) C07D 333/38 (2006.01)
Patent
CA 2032393
?7N ABSTRACT This invention relates to a compound of the formula: Image or a pharmaceutically acceptable salt thereof wherein X is oxygen, sulfur, -CH=CH-or -CH=N-; wherein R1 is alkyl, alkenyl or alkynyl of about 1 to 20 carbon atoms; wherein R is -CO2R2, tetrazole, methylsulfonamide or benzenesulfonamide, wherein R2 is hydrogen, alkyl of 1 to 6 carbon atoms or a pharmaceutically acceptable cation and R3 is hydroxyl or halogen, having utility as LTB4 synthesis inhibitors.
Djuric Stevan W.
Haack Richard A.
Miyashiro Julie M.
G.d. Searle & Co.
Osler Hoskin & Harcourt Llp
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