Magnetooptic layer and a process for its fabrication

Details Magnetooptic layer and a process for its fabrication Magnetooptic layer and a process for its fabrication

G - Physics

11

B

42/2, 204/96.09

G11B 7/24 (2006.01) G11B 11/105 (2006.01) G11B 13/04 (2006.01) H01F 10/13 (2006.01) H01F 10/32 (2006.01) H01F 41/18 (2006.01)

Patent

CA 2010014

HOECHST AKTIENGESELLSCHAFT - Werk KALLE - ALBERT 89/K 013 9 February 1990 WLK-DI.Z.-ge Abstract MAGNETOOPTIC LAYER AND A PROCESS FOR ITS FABRICATION The magnetooptic layer made from rare-earth metals and transition metals exhibits a gradient in the alloy composition over the layer depth, and has a coercive field strength of more than 8 kOe in a temperature range .DELTA.T = 100°C around the compensation temperature Tcomp. The fabrication is done using a dynamic sputtering process, in which the substrates to be coated are led past one or a plurality of sputter targets, which are arranged in a common plane parallel to the track of the substrates. A mask is located between the sputter targets and the substrates. (Fig- 1)

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