Magnetron atomization source and method of use thereof

Details Magnetron atomization source and method of use thereof Magnetron atomization source and method of use thereof

H - Electricity

01

J

H01J 25/50 (2006.01) C23C 14/35 (2006.01) G11B 7/26 (2006.01) H01J 37/317 (2006.01) H01J 37/34 (2006.01)

Patent

CA 2145570

For optimizing the yield of atomized-off material on a magnetron atomization source, a process space, on the source side, is predominantly walled by the atomization surface of the target body. The magnetron atomization source has a target body with a mirror-symmetrical, concavely constructed atomization surface with respect to at least one plane and a magnetic circuit arrangement operable to generate a magnetic field over the atomization surface. The magnetic circuit arrangement includes an anode arrangement, a receiving frame which extends around an edge of the target body and is electrically insulated with respect thereto. The receiving frame has a receiving opening for at least one workpiece to be coated. The magnetron source can be used to provide storage disks, such as CDs, with an atomization coating.

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