C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
204/96.08, 204/1
C23C 14/34 (2006.01) H01J 37/34 (2006.01)
Patent
CA 1242991
-47- ABSTRACT Magnetron Sputter Coating Source for Both Magnetic and Nonmagnetic Target Materials A novel magnetron sputter coating source is disclosed in which magnetic sputter targets containing relatively large inventories of usable material may be employed. This coating source may also be used efficiently and effectively with sputter target materials having proerties which range from nonmagnetic to highly ferromagnetic. Use of an electromagnetic coil with a widely adjustable energizing current, rather than permanent magnets, allows a wide range of magnetic properties to be accommodated. Electrical impedance of the glow discharge is readily controlled using the current flow through the electromagntic coil, allowing, for example, operation at desired values of voltage and current throughout the life of the sputter target. In addition, a momentary increase in electromagnet coil current can be used to achieve ignition of the glow discharge at a desired sputter gas operating pressure which is below the sputter gas pressure at which the glow discharge can normally be readily ignited. Also, use of the electromagnetic coil permits an easy conversion of the magnetron sputter coating source to a nonmagnetic diode apparatus. The use of a Hall probe positioned adjacent and below the sputter target near the region of maximum erosion is disclosed. The Hall probe voltage, which is proportional to the magnetic field intensity at the Hall probe position, may be measured throughout sputter target life to provide an independent means of assessing the approach to end of useful life. A novel sputter -48- target cooling means is disclosed in which a water chamber below the sputter target is divided into inlet and outlet portions by a septum. The flow of water through a narrow gap between the septum and the sputter target leads to highly effective heat transfer, which is also highly uniform along the peripheral path of intense heating of the sputter target.
458139
Boys Donald R.
Graves Walter E. Jr.
Novellus Systems Inc.
R. William Wray & Associates
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