Magnetron sputter source for mbe apparatus

Details Magnetron sputter source for mbe apparatus Magnetron sputter source for mbe apparatus

H - Electricity

01

L

H01L 21/203 (2006.01) C23C 14/35 (2006.01) C30B 23/02 (2006.01) C30B 23/06 (2006.01)

Patent

CA 2331564

A magnetron sputter source is adapted to fit into a K-cell port in a molecular beam epitaxy apparatus. The MSE source has a protruding cylindrical body for insertion into the K-cell port. The cylindrical body is attached at its proximal end to a flange and has its distal end open. An array of permanent magnets is arranged at the distal end of the cylindrical body. A magnet return piece is mounted behind the permanent magnets. A sputter target is mounted in front of the permanent magnets, and cooling ducts within the cylindrical body carry a cooling medium to the sputter target.

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