Magnetron sputtering cathode

Details Magnetron sputtering cathode Magnetron sputtering cathode

C - Chemistry, Metallurgy

23

C

204/96.08, 204/1

C23C 14/35 (2006.01) C23C 14/34 (2006.01) H01J 37/34 (2006.01)

Patent

CA 2002898

ABSTRACT OF INVENTION A superior method and magnetron sputtering cathode apparatus in which some of the flux lines forming the closed-loop magnetic tunnel are made to change their curvature from convex to slightly concave within a region of the tunnel intersecting the sputtering target volume, and over a substantial fraction of the tunnel width. The improved field shape reduces the tendency of the eroded area of the target to become narrower as erosion progresses, and thereby allows more complete consumption of the target.

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