Magnetron sputtering method and apparatus

Details Magnetron sputtering method and apparatus Magnetron sputtering method and apparatus

C - Chemistry, Metallurgy

23

C

C23C 14/35 (2006.01) C23C 14/04 (2006.01)

Patent

CA 2299482

An elongate emitter is used as a cathode to coat material onto a cylindrical workpiece by magnetron sputtering. Where the inside surface of the workpiece is coated, the workpiece itself is used as the vacuum sputtering chamber. The overlap between the plasma field and the magnetic field creates a coating zone which is moved along the length of the workpiece to evenly coat the workpiece.

Affiliated with

Also associated with

Rating

Magnetron sputtering method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnetron sputtering method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetron sputtering method and apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1499412