Magnetron sputtering targets

Details Magnetron sputtering targets Magnetron sputtering targets

C - Chemistry, Metallurgy

23

C

204/167.2

C23C 14/35 (2006.01) C23C 14/34 (2006.01) H01J 37/34 (2006.01)

Patent

CA 1323856

ABSTRACT OF THE DISCLOSURE A magnetron sputter coating device having a target of material to be sputtered and a magnetic means for producing a closed-loop magnetic tunnel capable of confining a glow discharge adjacent a surface of the target is disclosed. A groove is provided in the surface of the target along at least part of the erosion region. The groove affects the sputtering voltage and profile of the sputtering surface as it erodes. The dimensions and location of the groove can be selected to optimize the effects for particular magnetron sputtering devices.

570082

Affiliated with

Also associated with

Rating

Magnetron sputtering targets does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnetron sputtering targets, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetron sputtering targets will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1275238