G - Physics – 03 – C
Patent
G - Physics
03
C
96/171
G03C 5/00 (2006.01) G03F 7/029 (2006.01)
Patent
CA 1050327
NEGATIVE WORKING PHOTORESIST AND COMPOSITION Abstract A composition suitable as a negative working photoresist composition comprising an N-vinyl compound such as N-vinyl carba- zole, an organic halogen compound which is a source of free radicals, and as a binder, a maleic acid anhydride modified rosin. The resist composition is deposited on a suitable support and is exposed to a pattern of radiation in the usual way. A negative image is obtained by development with an alkaline liquid.
257189
Lewis James M.
Newyear Raymond W.
Horizons Research Incorporated
Na
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