Maleic anhydride modified rosin as binder for photoresist...

G - Physics – 03 – C

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96/171

G03C 5/00 (2006.01) G03F 7/029 (2006.01)

Patent

CA 1050327

NEGATIVE WORKING PHOTORESIST AND COMPOSITION Abstract A composition suitable as a negative working photoresist composition comprising an N-vinyl compound such as N-vinyl carba- zole, an organic halogen compound which is a source of free radicals, and as a binder, a maleic acid anhydride modified rosin. The resist composition is deposited on a suitable support and is exposed to a pattern of radiation in the usual way. A negative image is obtained by development with an alkaline liquid.

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