C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/223, 260/265
C07D 495/04 (2006.01) A61K 31/495 (2006.01)
Patent
CA 1308718
ABSTRACT OF THE DISCLOSURE This invention relates to a malonic acid derivative represented by the general formula (I) Image (I) wherein R1 and R2, which may be the same or different, represents hydrogen atom; C1-C12 alkyl group; C1-C9 alkyl group substituted with C1-C5 alkoxy group, a tetrahydro- furyl group, a phenyl group or a phenyl group substituted with 1 to 3 groups selected from the group consisting of halogen atoms, C1-C5 alkyl groups and C1-C5 alkoxy groups; or C2-C6 alkenyl group; R3 and R4, which may be the same or different, represent hydrogen atom, C1-C6 alkyl group, C2-C6 alkenyl group, C2-C8 alkoxyalkyl group, benzoyl group, C2-C8 alkylcarbonyl group, C2-C8 alkoxycarbonyl group, C1-C4 alkylsulfonyl group or aralkyl group including benzyl group, and R5, R6 and R7, which may be the same or different, represent hydrogen atom or C1-C4 alkyl group, and its pharmaceutically acceptable salts, a process for producing the same and a pharmaceutical composition containing the same.
559635
Hiraga Kunikazu
Kubota Shuhei
Nakayama Keisuke
Taninaka Kuniaki
Uchida Matazaemon
Fetherstonhaugh & Co.
Hiraga Kunikazu
Kubota Shuhei
Nakayama Keisuke
Nihon Nohyaku Co. Ltd.
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