Manufacture of integrated circuits using holographic techniques

Details Manufacture of integrated circuits using holographic techniques Manufacture of integrated circuits using holographic techniques

H - Electricity

01

L

356/147, 88/0.14

H01L 21/00 (2006.01) G03F 7/20 (2006.01) G03H 1/00 (2006.01) H01L 21/027 (2006.01)

Patent

CA 1273129

MANUFACTURE OF INTEGRATED CIRCUITS USING HOLOGRAPHIC TECHNIQUES" ABSTRACT OF THE DISCLOSURE. A method of manufacturing integrated circuits using holographic techniques by interference between an input beam and a reference beam generated from laser sources. A holographic image of the object formed on a mask window, is formed on recording emulsion coated on a glass slab by means of interference between the input beam which has passed through the mask and the reference beam which is reflected from the surface of a prism in contact with the glass slab. In order to reproduce the holographic image on a silicon slice which replaces the mask, the reference beam is replayed in the reverse direction through the prism such that the interference between the input beam and the replayed reference beam causes the holographic image to be created as a real image in the silicon slice.

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