Manufacture of microsieves and the resulting microsieves

Details Manufacture of microsieves and the resulting microsieves Manufacture of microsieves and the resulting microsieves

C - Chemistry, Metallurgy

25

D

117/59, 204/8

C25D 1/08 (2006.01)

Patent

CA 1309689

ABSTRACT Microsieves, particularly for sorting and sizing biological cells, are distinguished from the very delicate and readily deformable known microsieves by having improved rigidity and resistance to mechanical distortion such that the location of cell-sized non- conical microapertures in a grid-like pattern along X and Y axes is essentially permanent. The microsieves are prepared a method in which, (a) a photoresist layer is applied to an electrically conductive substrate, (b) preselected areas of photoresist are fixed to provide a patterned surface in the form of a gird-like array of discrete areas of fixed photoresist, (c) remaining photoresist is removed to expose a continuous area of the electrically conductive substrate, (d) the substrate is electroplated, and (e) the substrate and fixed photoresist are removed to provide a finished microsieve. Sequence a-e is subject to conditions [A], [B] and/or [C]: [A] the photoresist layer is at least 6 microns thick; [B] the electrically conductive substrate is integral with a rigid, electrically conductive frame; [C] the electroplating in step (d) is effected to the same height of the areas of fixed photoresist to provide a patterned surface in the form of a grid-like array in minute, closely spaced, precisely dimensioned areas of fixed photoresist surrounded continuously by electroplated metal, and before step (e), another photoresist layer is applied upon the patterned surface, the sequence a-d is repeated at least once, and in the final repetition, step (d) is omitted.

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