Manufacture of optical waveguide substrate

Details Manufacture of optical waveguide substrate Manufacture of optical waveguide substrate

G - Physics

02

B

G02B 6/13 (2006.01) C23C 8/10 (2006.01) G02B 6/122 (2006.01)

Patent

CA 2349147

An optical waveguide substrate, which has less particles or concave pits caused by Oxidation Induced Stacking Fault on the quartz film when oxidizing the surface of the silicon substrate relatively thickly and forming on its surface a quartz film to become an optical waveguide, is manufactured. The making method of the optical waveguide substrate comprises a step of exposing a silicon substrate to an atmosphere of oxidizing gas white heating to form a quartz film on the surface thereof for an optical waveguide, characterized in that a density of Oxygen contained in said silicon substrate is 24 ppma at maximum. The appratus 1 for manufacturing the optical waveguide substrate comprises a furnace core tube 18, for mounting a silicon substrate 15 to be oxidized and form a quartz film on the surface thereof, of winch exterior circumference is surrounded with a heating furnace 17, to which a pipe 11 for supplying oxidizing gas and an exhaust pipe are connected, characterized in that said gas supply pipe 11 is connected to a vaporizer 10 for evaporating hydrogen peroxide water 9.

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