Manufacturing process for grooved substrates and multilayer...

G - Physics – 11 – B

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G11B 7/26 (2006.01) B29D 17/00 (2006.01) G11B 7/24 (2006.01)

Patent

CA 2049261

GE9-90-001 A B S T R A C T Grooved substrates and multilayer structures, especially suitable for optical disks, are taught. The major process steps include spin coating of a supporting plate (1) with dissolved material forming a soft layer (7) thereon, stamping grooves (2) into the soft layer (7) to form a structured soft layer showing the negative image of the stamp and hardening the structured soft layer (7) by thermal treatment. The dissolved material contains polymeric organometal compounds comprising polymer siloxane and/or polymer silicates. In one embodiment the structured soft layer is a dielectric layer (8) containing various combinations of the oxides SiO2, La2O3, PbO and TiO2. The multilayer structure is completed by a magneto-optic layer (4), a reflector layer (5) and a passivation layer (6).

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