G - Physics
03
F
G03F 1/00 (2006.01) G03F 1/14 (2006.01)
Patent
CA 2316083
A method for repairing SCALPEL masks is described. In particular, opaque defects are repaired by milling with a gallium beam at a sufficient energy to ensure appropriate implantation of gallium into the membrane underlying the blocking material. Transparent defects are repaired using a gallium beam that impacts styrene gas in the vicinity of the defect to be repaired.
Harriott Lloyd Richard
Novembre Anthony Edward
Kirby Eades Gale Baker
Lucent Technologies Inc.
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