Measuring method and apparatus

Details Measuring method and apparatus Measuring method and apparatus

G - Physics

01

B

340/136

G01B 11/00 (2006.01) G01B 9/02 (2006.01) G03F 7/20 (2006.01) G03F 9/00 (2006.01)

Patent

CA 2039257

Disclosed is a method and apparatus for measuring a relative positional deviation between a first pattern and a second pattern, printed on an article such as a semiconductor wafer at different time moments, the measurement being based on detection of interference of diffraction lights from at least one of the first and second printed patterns.

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