B - Operations – Transporting – 08 – B
Patent
B - Operations, Transporting
08
B
B08B 7/00 (2006.01) B08B 3/12 (2006.01) D06F 19/00 (2006.01) D06F 43/08 (2006.01) H01L 21/00 (2006.01) H05K 3/26 (2006.01)
Patent
CA 2120537
MEGASONIC CLEANING SYSTEM USING COMPRESSED, CONDENSED GASES ABSTRACT OF THE DISCLOSURE A process for removing undesired sub-micrometer par- ticulates from a chosen substrate (16) comprising the steps of: (a) placing the substrate containing the undesired par- ticulates in a cleaning chamber (12) provided with mega- sonic energy-producing means (20); (b) introducing a lique- fied gas (22), such as liquid carbon dioxide, into the cleaning chamber and contacting the substrate containing the undesired particulates with the liquid carbon dioxide at a temperature below its critical temperature; and (c) exposing the liquid carbon dioxide to the megasonic energy- producing means for a period of time sufficient to remove the undesired particulates from the substrate. The sub- strate containing the undesired particulates may optionally be contacted with carbon dioxide in the dense phase prior to and/or after the treatment with megasonic energy to aid in removal of the undesired particulates. Further, spent liquid carbon dioxide may be treated to regenerate fresh liquid carbon dioxide which is recycled to the cleaning chamber. Other gases besides carbon dioxide which may be used include nitrous oxide, sulfur hexafluoride, and xenon. Further, gas mixtures and gas mixtures with suitable modi- fiers may be employed.
Chao Sidney C.
Stanford Thomas B. Jr.
Hughes Aircraft Company
Sim & Mcburney
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