C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/325.1, 260/3
C07D 207/16 (2006.01) C07D 207/22 (2006.01)
Patent
CA 1144930
ABSTRACT Compounds of the formula Image wherein X is oxysen or sulfur; R is hydrogen or lower alkyl; R1 is lower alkyl, lower alkenyl, lower alkynyl, phenyl or phenyl-lower alkylene, wherein the phenyl ring may include one or two substituents selected from the group consisting of C1-C4 alkyl, C1-C4 alkoxy, C1-C4 alkylthio, halogen, trifluoro- methyl, acetyloxy and hydroxy; R2 and R3 are independently selected from hydrogen, lower alkyl and trifluoromethyl; R4 is hydrogen, R5-?- or Image COOR R5 is lower alkyl, phenyl or phenyl-lower alkylene; and n is 0, 1 or 2. These compounds are useful as hypotensive agents.
331877
Krapcho John
Ondetti Miguel A.
Menarini International Operations Luxembourg S.a.
Osler Hoskin & Harcourt Llp
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