Metal-containing web processed with a continuous etch process

Details Metal-containing web processed with a continuous etch process Metal-containing web processed with a continuous etch process

B - Operations, Transporting

32

B

B32B 15/00 (2006.01) C23F 1/02 (2006.01) H05K 3/06 (2006.01) H05K 1/00 (2006.01)

Patent

CA 2460520

Corruption of features formed by etching a metal-containing web in a continuous etch process is reduced by distorting the original design or designs of the features to compensate for localized areas subject to excessive etching during the continuous etch process. In the case of a planar speaker diaphragm, for example, the width of the portions of the trace that are in a cross-machine direction is increased to compensate for the higher etching rate caused by the motion through the etch bath. While this causes the modified trace design to appear to be distorted relative to the original trace design, the etched trace resulting from the modified trace design has improved uniformity and greater fidelity to the original trace design than if the original trace design had been used in the continuous etch process.

Dans un procédé de gravure en continu, on réduit l'altération de caractéristiques formées par la gravure d'une bande contenant un métal en déformant le(s) motif(s) original/aux de ces caractéristiques afin de compenser la gravure excessive de zones locales pendant le procédé de gravure en continu. Dans le cas d'une membrane plane de haut-parleur, par exemple, la largeur des parties de la trace qui sont perpendiculaires au sens de la fabrication est accrue afin de compenser le taux de gravure supérieur dû au passage dans le bain de gravure. Bien que le motif de la trace modifiée paraisse déformé par rapport au motif trace original, la trace gravée résultant du motif de trace modifié présente une uniformité accrue et une fidélité supérieure au motif trace original utilisé dans le procédé de gravure en continu.

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