C - Chemistry – Metallurgy – 02 – F
Patent
C - Chemistry, Metallurgy
02
F
134/39, 260/517.
C02F 5/10 (2006.01) C02F 5/12 (2006.01) C02F 5/14 (2006.01) C07F 9/38 (2006.01)
Patent
CA 1229621
ABSTRACT OF THE DISCLOSURE New compounds have been prepared from dicyclo- pentadiene bis(methylamine) which have the following formula Image wherein substituents A, B, X and Y each are independently selected from radicals comprising hydrogen, C2 to C6 hydroxyalkyl; hydroxyethyl- and hydroxypropylsulfonic; methylenephosphonic; methylene-, ethylene- and propylene- sulfonic, C2 to C4 alkylcarboxylic acid radicals; and the alkali metal, alkaline earth metal, ammonia, and amine salts of the foregoing acids; and wherein at least one of A, B, X, and Y is other than hydrogen. These compounds are useful as ion control (chelating) agents in aqueous solutions. In a preferred embodi- ment, the compounds have threshhold (less than stochiometric amounts required) activity.
456755
Smart & Biggar
The Dow Chemical Company
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