Metal organic chemical vapor deposition equipment

Details Metal organic chemical vapor deposition equipment Metal organic chemical vapor deposition equipment

C - Chemistry, Metallurgy

23

C

C23C 16/46 (2006.01) C23C 16/455 (2006.01)

Patent

CA 2592747

Metal organic chemical vapor deposition equipment is metal organic chemical vapor deposition equipment for forming a film on a substrate by using a reactant gas, and includes a susceptor heating the substrate and having a holding surface for holding the substrate, and a flow channel for introducing the reactant gas to the substrate The susceptor is rotatable with the holding surface kept facing an inner portion of the flow channel, and a height of the flow channel along a flow direction of the reactant gas is kept constant from a position to a position, and is monotonically decreased from the position to the downstream side It is thereby possible to improve film formation efficiency while allowing the formed film to have a uniform thickness.

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