C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
260/514, 260/518
C07F 7/22 (2006.01) C07F 13/00 (2006.01) C08K 5/00 (2006.01) C08K 5/17 (2006.01)
Patent
CA 1048537
Abstract of the Disclosure Compounds having the formula Image wherein R1 and R2 are alkyl, cycloalkyl, phenyl, alkyl substituted phenyl, benzyl or alkyl substituted benzyl, R3 and R4 are both independently hydrogen or lower alkyl M is a metal, and n has a value of from 1 to 4, are good light stabilizers. The metal salts of this invention are prepared by reacting the appropriate amino acid or its alkali metal salt with a reactive form of the metal or metal complex.
221124
Spivack John D.
Stephen John F.
Ag Ciba-Geigy
Na
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