C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 14/30 (2006.01) C30B 23/02 (2006.01)
Patent
CA 2195486
By using a dual ion-beam sputtering apparatus, an aluminum thin-film is formed on a glass substrate made of an amorphous material. While radiating an ion beam for assisting the film formation from an ion source onto the glass substrate, the aluminum thin-film is formed by depositing the sputtering ions which are generated by radiating an ion beam onto an aluminum target.
€ l'aide d'un appareil à érosion superficielle à double faisceau d'ions, on dépose une pellicule mince d'aluminium sur un substrat de verre fabriqué à partir d'un matériau amorphe. Alors qu'un faisceau d'ions est projeté par une source d'ions sur le substrat de verre afin de faciliter la formation de la pellicule mince d'aluminium, celle-ci est formée par le dépôt des ions pulvérisés produits par la projection d'un faisceau d'ions sur la cible d'aluminium.
Kobayashi Masato
Nakanishi Hidefumi
Sakurai Atsushi
Yoshino Yukio
Mccarthy Tetrault Llp
Murata Manufacturing Co. Ltd.
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