Metalorganic chemical vapor deposition (mocvd) process and...

C - Chemistry – Metallurgy – 23 – C

Patent

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C23C 16/06 (2006.01) C23C 16/44 (2006.01)

Patent

CA 2529373

An OCVD apparatus and process for producing multi-layer HTS-coated tapes with increased current capacity which includes multiple liquid precursor sources, each having an associated pump and vaporizer, the outlets of which feed a multiple compartment showerhead apparatus within an MOCVD reactor. The multiple compartment showerhead apparatus is located in close proximity to an associated substrate heater which together define multiple deposition sectors in a deposition zone.

L'invention concerne un appareil et un procédé MOCVD pour produire des bandes multicouche enrobées à capacité de courant accrue. Ledit appareil comporte des sources de précurseurs liquides multiples, chacune équipée d'une pompe et d'un vaporisateur, dont les sorties alimentent un appareil à pomme d'arrosoir multi-compartiments à l'intérieur d'un réacteur MOCVD. Ledit appareil à pomme d'arrosoir multi-compartiments est placé à proximité d'un dispositif de chauffage de substrat associé, tous deux définissant plusieurs secteurs de déposition dans une zone de déposition.

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