C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
204/96.08, 204/1
C23C 14/24 (2006.01) C23C 14/32 (2006.01) H01J 37/32 (2006.01) H05H 1/50 (2006.01)
Patent
CA 1278773
ABSTRACT OF THE DISCLOSURE Method and apparatus for arc evaporating a large target having a surface area of at least about 20 square inches, including a device for confining the arc to the target surface and a magnetic field source for establishing at least one magnetic field in a predetermined direction over the target surface to thus direct the cathode spot of the arc in a direction sub- stantially perpendicular to the direction of the magnetic field and accordingly effect substantially uniform evaporation of the target by the arc where the magnetic field may be either pulsed or continuous.
488228
Hauzer Industries B.v.
Parks Thompson & Macgregor
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