Method and apparatus for captivating a substrate within a...

Details Method and apparatus for captivating a substrate within a... Method and apparatus for captivating a substrate within a...

H - Electricity

01

L

356/200

H01L 41/22 (2006.01) G03F 7/00 (2006.01) G03F 9/00 (2006.01)

Patent

CA 1202123

Abstract A method of captivating a substrate within a. holder for photolithographic processing is shown. A substrate is placed within the aperture of a holder and is sandwiched into place by laminating it with layers of dry film photopolymer resist. Portions of the photopolymer resist are polymerized. Unpolymer- ized portions are washed away leaving retaining tabs of polymerized resist which hold the substrate within the holder for an etching or plating process.

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