G - Physics – 01 – M
Patent
G - Physics
01
M
G01M 11/02 (2006.01) G03F 7/20 (2006.01)
Patent
CA 2311053
Characterization of an optical system (18) is quickly and easily obtained in a single acquisition step by obtaining image data within a volume of image space (20). A reticle (16) and image plane (22) are positioned obliquely with respect to each other such that a reticle having a plurality of feature sets (116a-e) thereon, including periodic patterns or gratings (216a-e), is imaged in a volume of space, including the depth of focus. Metrology tools are used to analyze the detected or recorded image in the volume of space through the depth of focus in a single step or exposure to determine the imaging characteristics of an optical system. Focus, field curvature, astigmatism, spherical, coma, and/or focal plane deviations may be determined. The present invention is particularly applicable to semiconductor manufacturing and photolithographic techniques used therein, and is able to quickly characterize an optical system in a single exposure with dramatically increased data quality and continuous coverage of the full parameter space.
Osler Hoskin & Harcourt Llp
Svg Lithography Systems Inc.
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