Method and apparatus for coating a substrate in a vacuum

Details Method and apparatus for coating a substrate in a vacuum Method and apparatus for coating a substrate in a vacuum

C - Chemistry, Metallurgy

23

C

C23C 16/00 (2006.01) C23C 14/12 (2006.01) C23C 14/24 (2006.01)

Patent

CA 2388178

A method and apparatus for coating a substrate with a deposition material in a vacuum wherein a material source having a substantially longitudinal deposition emission component is used to create a substantially longitudinal material deposition emission plume which coats a surface of the substrate without increasing the throw distance between the substrate and the material source.

La présente invention concerne un procédé et un appareil destiné au dépôt sous vide d'un matériau sur un substrat. Ce matériau de départ possédant un composant d'émission de dépôt sensiblement longitudinal est utilisé pour créer une plume d'émission de dépôt du matériau sensiblement longitudinale qui dépose un revêtement sur la surface du substrat sans augmenter la distance de pulvérisation entre le substrat et le matériau de départ.

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