Method and apparatus for continuous cleaning of substrate...

Details Method and apparatus for continuous cleaning of substrate... Method and apparatus for continuous cleaning of substrate...

H - Electricity

01

L

H01L 21/77 (2006.01) H01L 21/00 (2006.01)

Patent

CA 2273717

The present invention provides new and improved methods and apparatus for removing contamination from surfaces of substrates. Existing techniques include plasma ashing, glow discharge or UV/ozone processes. The present invention includes cleaning the substrate surfaces by transporting the substrates to be cleaned through a first zone where the substrates are heated preferably in a nitrogen atmosphere and then to a second zone where the substrates are surrounded by an atmosphere of ozone. The organic contamination is thereby vaporized into vapor products including CO, CO2 and H2O.

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