Method and apparatus for depositing conducting oxide on a...

Details Method and apparatus for depositing conducting oxide on a... Method and apparatus for depositing conducting oxide on a...

C - Chemistry, Metallurgy

23

C

204/96.08, 204/1

C23C 14/34 (2006.01) C03C 17/245 (2006.01) C23C 14/08 (2006.01) C23C 14/54 (2006.01) H01B 1/08 (2006.01) H01J 37/34 (2006.01)

Patent

CA 1184877

ABSTRACT OF THE DISCLOSURE There is described a method and an apparatus for depositing oxide, such as zinc oxide, on a substrate by R.F. magnetron sputtering. The oxide deposit is "switched" from a non-conducting to a highly conducting material by a second discharge caused by a voltage applied to a screen grid immediately in front of the substrate, or is rendered conducting by a heating step.

402706

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