Method and apparatus for depositing thin layers of...

Details Method and apparatus for depositing thin layers of... Method and apparatus for depositing thin layers of...

B - Operations, Transporting

05

B

32/16, 117/54

B05B 5/00 (2006.01) C23C 14/00 (2006.01)

Patent

CA 1071936

ABSTRACT OF THE DISCLOSURE: A method and apparatus for depositing thin layers of insulating or slightly conductive materials involves reactive spraying through high-frequency inductive plasma. The conduc- tive component of the material to be deposited is sprayed in a first chamber through which an ionizable inert gas travels, the sprayed particles then passing through a second chamber in which a substrate is placed and to which a reactive gas is supplied. Insulating and weakly inductive materials such as oxides, car- bide and nitrides may be deposited at a rate substantially com- parable with the rate for conductive materials to obtain high qualify uniform deposits.

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