G - Physics – 01 – N
Patent
G - Physics
01
N
324/23
G01N 27/26 (2006.01) G01N 17/02 (2006.01)
Patent
CA 1136218
- 53 - Abstract of the Disclosure A test piece is immersed in an electroless plating bath. It is then electrically charged instantaneously via a counter electrode to have a polarization potential ?(t) of a few millivolts. The charge consumed by the electroless plating reaction of the test piece is measured by a potential recorder in the form of a variation of the polarization potential ?(t) with respect to time t. The ?(t)-t relation is analyzed to obtain a resistance R of the test piece. After the potential of the test piece has returns to electroless deposition potential EELP, the test piece is charged again until its polarization potential ?(t) rises to 50 millivolts or more. A ?(t)-t relation is obtained. Based on the ?(t)-t relation, a Tafel slope .beta.a of anodic reaction is obtained. After the potential of the test piece has returned to electroless deposition potential EELP, the test piece is so charged for the third time as to have its polarization potential ?(t) lowered to -50 millivolts or less, and a ?(t)-t relation is obtained. This relation is analyzed to obtain a Tafel slope .beta.c of anodic reaction of the test piece. Based on the reaction resistance R, Tafel slopes .beta.a and .beta.c, an electroless plating current density IELP is obtained. Based on the electroless plating current density IELP, a rate of electroless plating VELP is calculated.
347282
Kanno Ken-Ichi
Sato Yuichi
Suzuki Masayuki
Ridout & Maybee Llp
Tokyo Shibaura Denki Kabushiki Kaisha
LandOfFree
Method and apparatus for evaluating electroless plating does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for evaluating electroless plating, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for evaluating electroless plating will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-843893