Method and apparatus for exposing photoresist by using an...

Details Method and apparatus for exposing photoresist by using an... Method and apparatus for exposing photoresist by using an...

H - Electricity

01

J

356/176, 356/192

H01J 37/317 (2006.01) G03F 7/20 (2006.01)

Patent

CA 1226075

-21- METHOD AND APPARATUS FOR EXPOSING PHOTORESIST BY USING AN ELECTRON BEAM AND CONTROLLING ITS VOLTAGE AND CHARGE Abstract of the Disclosure A method and apparatus are disclosed for exposing photoresist using an incident electron beam during the fabrication of a semiconductor device. The method includes the steps of coating the substrate with a photoresist that is exposed in response to an electron beam. An electron beam is projected onto the photoresist and deflected to trace a pattern. The voltage and the amount of charge of the electron beam are controlled as it is deflected so that the energy incident upon the coated photoresist is correlated to variations in the photoresist thickness to expose pho- toresist with minimal penetration therethrough to underlying structures.

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