Method and apparatus for exposing photosensitive material

Details Method and apparatus for exposing photosensitive material Method and apparatus for exposing photosensitive material

B - Operations, Transporting

41

B

95/14

B41B 13/00 (2006.01) B41B 15/00 (2006.01) B41B 17/00 (2006.01) G02B 5/32 (2006.01) G03F 7/20 (2006.01)

Patent

CA 1207580

Abstract of the Disclosure Exposure patterns are formed in photosensitive material by multiple beam laser interferometry by a method which involves exposing said photosensitive material simultaneously to at least three coherent beams of exposing radiation wherein the sources of said beams are arranged substantially symmetrically around an axis perpendicular to the plane of said photosensitive material. Preferably, surface relief patterns are formed by developing said exposed material. Apparatus for providing such multiple coherent beams is also disclosed.

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