Method and apparatus for fabricating waveguides and...

G - Physics – 02 – B

Patent

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Details

G02B 6/12 (2006.01) G02B 6/122 (2006.01) G02B 6/138 (2006.01) G02B 6/42 (2006.01) G02B 6/43 (2006.01)

Patent

CA 2494307

A method for adaptively fabricating a waveguide (30) comprises: measuring misplacement of a photonic device (31, 32, 34) relative to a substrate (20); generating computer readable instructions for using a plurality of graphics primitives (16) to form the waveguide; and photocomposing the waveguide on the substrate in accordance with the computer readable instructions. A reticle (14) comprises a plurality of graphics primitives with at least one of the plurality of graphics primitives comprising a tapered end. A waveguide (30) comprises a plurality of waveguide segments (22) with each of the plurality of waveguide segments comprising a tapered end and being adjacent to at least one other of the plurality of waveguide segments.

L'invention concerne un procédé de fabrication adaptative d'un guide d'onde (30), consistant à mesurer une erreur d'emplacement d'un dispositif photonique (31, 32, 34) par rapport à un substrat (20), à générer des instructions lisibles par ordinateur pour former une pluralité de primitives graphiques (16) afin de former le guide d'onde, et à photocomposer le guide d'onde sur le substrat à partir des instructions lisibles par ordinateur. Un réticule (14) comprend une pluralité de primitives graphiques, une primitive graphique au moins de la pluralité de primitives graphiques présentant une extrémité conique. Un guide d'onde (30) comprend une pluralité de segments (22) de guide d'onde, chaque segment de la pluralité de segments de guide d'onde présentant une extrémité conique et étant adjacent à au moins un autre segment de la pluralité de segments de guide d'onde.

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