Method and apparatus for forming thin film oxide layers...

Details Method and apparatus for forming thin film oxide layers... Method and apparatus for forming thin film oxide layers...

C - Chemistry, Metallurgy

23

C

204/167, 204/96.

C23C 14/00 (2006.01)

Patent

CA 1164407

ABSTRACT OF THE DISCLOSURE Apparatus and method for forming high quality thin film oxide layers on a substrate by a reactive evaporation process utilizing an oxygen plasma activation source in the form of a cylindrical boule of insulating material surrounded by a radio frequency coil for generating a radio frequency electromagnetic field in the boule of sufficient magnitude to create a self-igniting oxygen plasma within the boule without evaporating material from the walls thereof.

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