Method and apparatus for generating induced plasma

Details Method and apparatus for generating induced plasma Method and apparatus for generating induced plasma

H - Electricity

05

H

H05H 1/46 (2006.01) H05H 1/30 (2006.01) H05H 1/36 (2006.01)

Patent

CA 2144834

An induced plasma generating apparatus comprises: a seed gas supply unit for supplying a seed gas, a first chamber for receiving the seed gas: a DC current source; a pair of electrodes connected to the DC current source for causing a discharge in the first chamber to generate a plasma from the seed gas; a nozzle for ejecting the plasma from the first chamber; a second chamber for receiving the plasma ejected from the first chamber; an AC current source; and a coil connected to the AC current source and disposed to surround the second chamber for producing a magnetic field in the second chamber. An induced plasma is generated by subjecting plasma in the second chamber to the magnetic field.

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