Method and apparatus for in situ cleaning of excimer laser...

Details Method and apparatus for in situ cleaning of excimer laser... Method and apparatus for in situ cleaning of excimer laser...

B - Operations, Transporting

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C

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B24C 1/08 (2006.01) B24C 3/32 (2006.01) H01S 3/034 (2006.01) H01S 3/225 (2006.01)

Patent

CA 2019862

ABSTRACT OF THE DISCLOSURE A method and apparatus for cleaning the optical elements in an excimer laser in situ. A source of high pressure carbon dioxide gas is allowed to escape through a nozzle facing the surface of the optical elements. The escaping gas expands and cools sufficiently to form a carbon dioxide ice jet. The ice jet strikes the surface of the optical elements causing cleaning of the elements by abrasion. Carbon dioxide may be removed merely by evacuation and purging of the system. Thus the mirrors are cleaned without removing them.

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