C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 14/02 (2006.01) B05D 7/24 (2006.01) C23C 14/12 (2006.01) C23C 14/22 (2006.01) H01J 37/317 (2006.01) H01J 37/32 (2006.01)
Patent
CA 2477258
A method and apparatus for plasma treatment and deposition of ionized molecules on a surface an object in a vacuum. In one embodiment the apparatus comprises a vacuum system (200) having a plasma-treatment system (400) and an ion deposition system (300).
L'invention porte sur un procédé et sur un appareil de traitement au plasma et de dépôt de molécules ionisées sur une surface d'un objet dans un vide. Selon une forme d'exécution, l'appareil comprend un système sous vide (200) possédant un système de traitement au plasma (400) et un système de dépôt ionique.
Elam William T.
Kitching Kathryn J.
Lee Hak-No
Ratner Buddy D.
Turecek Frank
Borden Ladner Gervais Llp
University Of Washington
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