Method and apparatus for making grating

Details Method and apparatus for making grating Method and apparatus for making grating

G - Physics

02

B

358/22, 88/0.1

G02B 1/00 (2006.01) G02B 5/00 (2006.01) G02B 27/42 (2006.01) G03B 27/00 (2006.01) H01L 21/30 (2006.01)

Patent

CA 1153227

Abstract of the Disclosure Soft carbon-K X-rays expose a Poly Methyl Methacralate (PMMA), or Plexiglas*, photoresist on an oxide layer of a sil- icon substrate through a parent mask separated a distance S from the resist by a spacer with the parent mask slits defining a spatial period p to establish an intensity pattern of period p/n at the photomask with S p2/n .lambda., where .lambda. is the wavelength of the incident radiation and .lambda.<<p. * Registered trademark

352905

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