Method and apparatus for manufacturing cleaned substrates or...

Details Method and apparatus for manufacturing cleaned substrates or... Method and apparatus for manufacturing cleaned substrates or...

B - Operations, Transporting

08

B

B08B 7/00 (2006.01) H01J 37/32 (2006.01) H01L 21/00 (2006.01) H01L 21/306 (2006.01)

Patent

CA 2664516

Plasma etch-cleaning of substrates is performed by means of a plasma discharge arrangement comprising an electron source cathode (5) and an anode arrangement (7). The anode arrangement (7) comprises on one hand an anode electrode (9) and on the other hand and electrically isolated therefrom a confinement (11). The confinement (11) has an opening (13) directed towards an area (S) of a substrate (21) to be cleaned. The electron source cathode (5) and the anode electrode (9) are electrically supplied by a supply circuit with a supply source (19). The circuit is operated electrically floating.

L'invention concerne le nettoyage de gravure par plasma de substrats étant réalisé au moyen d'un agencement de décharge de plasma comprenant une cathode source d'électrons (5) et un agencement d'anode (7). L'agencement d'anode (7) comprend d'une part une électrode d'anode (9) et d'autre part un confinement (11) électriquement isolé de celle-ci. Le confinement (11) a une ouverture (13) dirigée vers une zone (S) d'un substrat (21) à nettoyer. La cathode source d'électrons (5) et l'électrode d'anode (9) sont alimentées électriquement par un circuit d'alimentation avec une source d'alimentation (19). Le système est exploité en flottement électrique.

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