Method and apparatus for measuring wavefront aberrations

A - Human Necessities – 61 – B

Patent

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A61B 3/10 (2006.01) A61B 3/103 (2006.01) A61B 3/12 (2006.01) A61B 3/14 (2006.01) G01J 9/00 (2006.01)

Patent

CA 2446651

An apparatus and method for measuring wavefront aberrations. A beam splitter separates the aberrated wavefront into two components, mirror arrays focus each of the components to a plurality of discrete lines with the discrete lines of one component having a different orientation than the discrete lines of the other component, and an imaging device detects the discrete lines to determine wavefront aberrations. The method includes separating the wavefront into two components, focusing each of the components into a plurality of discrete lines with the discrete lines of one component having a different orientation than the discrete lines of the other component, and detecting information related to the discrete lines.

L'invention porte sur un appareil et un procédé de mesure des aberrations de front d'ondes. Un diviseur de faisceaux sépare le front d'ondes aberrant en deux composants, des réseaux de miroirs disposent chacun des composants en une pluralité de droites discrètes, les droites discrètes d'un composant présentant une orientation différente de celle des droites discrètes de l'autre composant, et un dispositif d'imagerie détecte les droites discrètes afin de déterminer les aberrations de front d'ondes. Ce procédé consiste à séparer le front d'ondes en deux composants, à disposer chacun des composants en une pluralité de droites discrètes avec les lignes discrètes d'un composant présentant une orientation différente de celle des droites discrètes de l'autre composant, et à repérer des informations relatives aux droites discrètes.

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