Method and apparatus for measuring wavefront aberrations

A - Human Necessities – 61 – B

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A61B 3/103 (2006.01) G01J 9/00 (2006.01)

Patent

CA 2424169

An apparatus and method for measuring wavefront aberrations. The apparatus comprises a reflecting device (128) for reflecting selected portions of the wavefront (126), an imaging device (132) for capturing information related to the selected portions, and a processor (136) for calculating aberrations of the wavefront from the captured information. The method comprises reflecting selected portions of a wavefront (126) onto the imaging device (132), capturing information related to the selected portions, and processing the captured information to derive the aberrations.

L'invention concerne un appareil et un procédé de mesure des aberrations de front d'ondes. Cet appareil comprend un dispositif réfléchissant (128) qui réfléchit des parties sélectionnées du front d'onde (126), un dispositif d'imagerie (132) qui recueille des informations relatives aux parties sélectionnées précitées, et un processeur (136) qui calcule les aberrations du front d'onde à partir des informations recueillies. Ce procédé consiste à réfléchir les parties sélectionnées d'un front d'onde (126) sur le dispositif d'imagerie (132), à recueillir les informations relatives aux parties sélectionnées, et à traiter les informations recueillies pour obtenir les aberrations.

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