Method and apparatus for plasma generation

Details Method and apparatus for plasma generation Method and apparatus for plasma generation

H - Electricity

01

J

H01J 49/10 (2006.01) H01J 27/24 (2006.01) H01J 49/16 (2006.01) H01J 49/40 (2006.01) H01J 49/42 (2006.01) H01J 61/68 (2006.01) H01J 61/90 (2006.01)

Patent

CA 2533311

An RF-driven plasma source, including a pair of spaced-apart plasma electrodes, wherein the electrodes act as plates of a capacitor, the gas electrically discharges and creates a plasma of both positive and negative ions, in a clean process that enables efficient sample analysis, with preferred isolated sample photo-ionization, reduced-power operation and also including signal detection with modulated drive electronics.

L'invention concerne une source de plasma commandée par radiofréquences, qui comprend une paires d'électrodes à plasma espacées, lesdites électrodes agissant comme plaques d'un condensateur. Le gaz décharge électriquement et génère un plasma à ions tant positifs que négatifs dans un processus propre qui permet une analyse d'échantillon efficace avec photo-ionisation préférée d'un échantillon isolé, fonctionnement à consommation électrique réduite, mais aussi détection de signal à l'aide d'une électronique de commande modulée.

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