H - Electricity – 05 – H
Patent
H - Electricity
05
H
H05H 1/46 (2006.01) B01J 19/08 (2006.01) B01D 67/00 (2006.01)
Patent
CA 2622229
A method for plasma treatment of a porous material comprising the steps of generating plasma using an inert gas or a mixed gas of the inert gas and a reactive gas, and performing any one of the following procedures (a) to (c) to achieve the plasma treatment of the surface and the inside of a pore of the porous material: (a) spraying the resulting plasma gas onto the porous material at a flow rate of 0.002 to 2 L/min/cm2 per unit area of the porous material; (b) sucking the porous material under the atmosphere of the plasma gas; or (c) sucking the porous material while spraying the plasma gas onto the porous material at a flow rate as mentioned above.
La présente invention concerne un procédé de traitement par plasma d~un matériau poreux comprenant les étapes de génération de plasma au moyen d~un gaz inerte ou d~un mélange gazeux du gaz inerte et d~un gaz réactif, et de réalisation de l~une quelconque des procédures (a) à (c) suivantes pour mener à bien le traitement par plasma de la surface et de l~intérieur d~un pore du matériau poreux : (a) aspersion du gaz plasma obtenu sur le matériau poreux à une vitesse de circulation comprise entre 0,002 à 2 L/min/cm2 par zone unitaire du matériau poreux ; (b) aspiration du matériau poreux sous l~atmosphère du gaz plasma ; ou (c) aspiration du matériau poreux pendant l~aspersion du gaz plasma sur le matériau poreux à une vitesse de circulation telle qu~elle est mentionnée ci-dessus.
Kimishima Kotaro
Kiso Kazuki
Kono Koichi
Smart & Biggar
Tonen Chemical Corporation
Toray Tonen Specialty Separator Godo Kaisha
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